Date (Default Date) | Hs Code | Product Description (Based On Hs Code) | Net Weight | CIF In USD | Origin Country | Details |
---|---|---|---|---|---|---|
31-01-2019 | 70023110 | FUSED QUARTZ/OTH FUSED SILICA FOR VACUUM TUBES | 4 | 332 | JAPAN | |
31-01-2019 | 70023110 | FUSED QUARTZ/OTH FUSED SILICA FOR VACUUM TUBES | 4801 | 2838 | SINGAPORE | |
31-01-2019 | 70023190 | OTH OF FUSED QUARTZ/OTH FUSED SILICA FOR VACUUM TUBES | 70586 | 60454 | CHINA | |
31-01-2019 | 70023190 | OTH OF FUSED QUARTZ/OTH FUSED SILICA FOR VACUUM TUBES | 45 | 12861 | GERMANY, FED. REP. OF | |
31-01-2019 | 70023190 | OTH OF FUSED QUARTZ/OTH FUSED SILICA FOR VACUUM TUBES | 1048 | 45868 | JAPAN | |
31-01-2019 | 70023190 | OTH OF FUSED QUARTZ/OTH FUSED SILICA FOR VACUUM TUBES | 38 | 256 | KOREA, REPUBLIC OF | |
31-01-2019 | 70023190 | OTH OF FUSED QUARTZ/OTH FUSED SILICA FOR VACUUM TUBES | 49 | 2876 | SINGAPORE | |
31-01-2019 | 70023190 | OTH OF FUSED QUARTZ/OTH FUSED SILICA FOR VACUUM TUBES | 500000 | 150000 | TAIWAN | |
31-01-2019 | 70171010 | QUARTZ REACTOR TUBES&HOLDERS GLASS, FOR PRODUCTION OF SEMICONDUCTOR WAFERS | 86 | 8015 | AUSTRALIA | |
31-01-2019 | 70171010 | QUARTZ REACTOR TUBES&HOLDERS GLASS, FOR PRODUCTION OF SEMICONDUCTOR WAFERS | 48 | 2635 | CHINA | |
31-01-2019 | 70171010 | QUARTZ REACTOR TUBES&HOLDERS GLASS, FOR PRODUCTION OF SEMICONDUCTOR WAFERS | 11 | 910 | GERMANY, FED. REP. OF | |
31-01-2019 | 70171010 | QUARTZ REACTOR TUBES&HOLDERS GLASS, FOR PRODUCTION OF SEMICONDUCTOR WAFERS | 1 | 44 | POLAND | |
31-01-2019 | 70171010 | QUARTZ REACTOR TUBES&HOLDERS GLASS, FOR PRODUCTION OF SEMICONDUCTOR WAFERS | 1 | 348 | SWITZERLAND | |
31-01-2019 | 70171010 | QUARTZ REACTOR TUBES&HOLDERS GLASS, FOR PRODUCTION OF SEMICONDUCTOR WAFERS | 1 | 406 | UNITED KINGDOM | |
31-01-2019 | 70171010 | QUARTZ REACTOR TUBES&HOLDERS GLASS, FOR PRODUCTION OF SEMICONDUCTOR WAFERS | 119 | 17878 | UNITED STATES | |
31-01-2019 | 70200020 | QUARTZ REACTOR TUBES&HOLDERS DESIGNED FOR PRODUCTION OFSEMICONDUCTOR WAFERS | 648 | 1980 | CHINA | |
28-02-2019 | 70023190 | OTH OF FUSED QUARTZ/OTH FUSED SILICA FOR VACUUM TUBES | 2 | 2956 | CANADA | |
28-02-2019 | 70023190 | OTH OF FUSED QUARTZ/OTH FUSED SILICA FOR VACUUM TUBES | 29587 | 20263 | CHINA | |
28-02-2019 | 70023190 | OTH OF FUSED QUARTZ/OTH FUSED SILICA FOR VACUUM TUBES | 11 | 1213 | JAPAN | |
28-02-2019 | 70023190 | OTH OF FUSED QUARTZ/OTH FUSED SILICA FOR VACUUM TUBES | 200000 | 60000 | TAIWAN | |
28-02-2019 | 70171010 | QUARTZ REACTOR TUBES&HOLDERS GLASS, FOR PRODUCTION OF SEMICONDUCTOR WAFERS | 18 | 2098 | AUSTRALIA | |
28-02-2019 | 70171010 | QUARTZ REACTOR TUBES&HOLDERS GLASS, FOR PRODUCTION OF SEMICONDUCTOR WAFERS | 1 | 444 | CANADA | |
28-02-2019 | 70171010 | QUARTZ REACTOR TUBES&HOLDERS GLASS, FOR PRODUCTION OF SEMICONDUCTOR WAFERS | 116 | 1980 | CHINA | |
28-02-2019 | 70171010 | QUARTZ REACTOR TUBES&HOLDERS GLASS, FOR PRODUCTION OF SEMICONDUCTOR WAFERS | 1 | 50 | GERMANY, FED. REP. OF | |
28-02-2019 | 70171010 | QUARTZ REACTOR TUBES&HOLDERS GLASS, FOR PRODUCTION OF SEMICONDUCTOR WAFERS | 2 | 936 | HONG KONG | |
28-02-2019 | 70171010 | QUARTZ REACTOR TUBES&HOLDERS GLASS, FOR PRODUCTION OF SEMICONDUCTOR WAFERS | 20 | 490 | INDIA | |
28-02-2019 | 70171010 | QUARTZ REACTOR TUBES&HOLDERS GLASS, FOR PRODUCTION OF SEMICONDUCTOR WAFERS | 5 | 2178 | JAPAN | |
28-02-2019 | 70171010 | QUARTZ REACTOR TUBES&HOLDERS GLASS, FOR PRODUCTION OF SEMICONDUCTOR WAFERS | 5 | 568 | SWITZERLAND | |
28-02-2019 | 70171010 | QUARTZ REACTOR TUBES&HOLDERS GLASS, FOR PRODUCTION OF SEMICONDUCTOR WAFERS | 125 | 13814 | UNITED STATES | |
28-02-2019 | 70200020 | QUARTZ REACTOR TUBES&HOLDERS DESIGNED FOR PRODUCTION OFSEMICONDUCTOR WAFERS | 181 | 181 | CHINA | |
28-02-2019 | 70200020 | QUARTZ REACTOR TUBES&HOLDERS DESIGNED FOR PRODUCTION OFSEMICONDUCTOR WAFERS | 2 | 668 | JAPAN | |
28-02-2019 | 70200020 | QUARTZ REACTOR TUBES&HOLDERS DESIGNED FOR PRODUCTION OFSEMICONDUCTOR WAFERS | 16 | 67 | SINGAPORE | |
31-03-2019 | 70023190 | OTH OF FUSED QUARTZ/OTH FUSED SILICA FOR VACUUM TUBES | 25966 | 18483 | CHINA | |
31-03-2019 | 70023190 | OTH OF FUSED QUARTZ/OTH FUSED SILICA FOR VACUUM TUBES | 1 | 3 | HONG KONG | |
31-03-2019 | 70023190 | OTH OF FUSED QUARTZ/OTH FUSED SILICA FOR VACUUM TUBES | 986 | 4251 | SINGAPORE | |
31-03-2019 | 70023190 | OTH OF FUSED QUARTZ/OTH FUSED SILICA FOR VACUUM TUBES | 200000 | 60000 | TAIWAN | |
31-03-2019 | 70023190 | OTH OF FUSED QUARTZ/OTH FUSED SILICA FOR VACUUM TUBES | 12960 | 4095 | UNITED ARAB EMIRATES | |
31-03-2019 | 70023190 | OTH OF FUSED QUARTZ/OTH FUSED SILICA FOR VACUUM TUBES | 1 | 85 | UNITED STATES | |
31-03-2019 | 70171010 | QUARTZ REACTOR TUBES&HOLDERS GLASS, FOR PRODUCTION OF SEMICONDUCTOR WAFERS | 138 | 26149 | AUSTRALIA | |
31-03-2019 | 70171010 | QUARTZ REACTOR TUBES&HOLDERS GLASS, FOR PRODUCTION OF SEMICONDUCTOR WAFERS | 207 | 12515 | CHINA | |
31-03-2019 | 70171010 | QUARTZ REACTOR TUBES&HOLDERS GLASS, FOR PRODUCTION OF SEMICONDUCTOR WAFERS | 3 | 251 | GERMANY, FED. REP. OF | |
31-03-2019 | 70171010 | QUARTZ REACTOR TUBES&HOLDERS GLASS, FOR PRODUCTION OF SEMICONDUCTOR WAFERS | 22 | 126 | KOREA, REPUBLIC OF | |
31-03-2019 | 70171010 | QUARTZ REACTOR TUBES&HOLDERS GLASS, FOR PRODUCTION OF SEMICONDUCTOR WAFERS | 1 | 204 | SWITZERLAND | |
31-03-2019 | 70171010 | QUARTZ REACTOR TUBES&HOLDERS GLASS, FOR PRODUCTION OF SEMICONDUCTOR WAFERS | 20 | 461 | TAIWAN | |
31-03-2019 | 70171010 | QUARTZ REACTOR TUBES&HOLDERS GLASS, FOR PRODUCTION OF SEMICONDUCTOR WAFERS | 278 | 26605 | UNITED STATES | |
31-03-2019 | 70200020 | QUARTZ REACTOR TUBES&HOLDERS DESIGNED FOR PRODUCTION OFSEMICONDUCTOR WAFERS | 35 | 48 | CHINA | |
31-03-2019 | 70200020 | QUARTZ REACTOR TUBES&HOLDERS DESIGNED FOR PRODUCTION OFSEMICONDUCTOR WAFERS | 32 | 743 | MALAYSIA | |
30-04-2019 | 70023190 | OTH OF FUSED QUARTZ/OTH FUSED SILICA FOR VACUUM TUBES | 25790 | 17779 | CHINA | |
30-04-2019 | 70023190 | OTH OF FUSED QUARTZ/OTH FUSED SILICA FOR VACUUM TUBES | 10 | 530.569 | GERMANY, FED. REP. OF | |
30-04-2019 | 70023190 | OTH OF FUSED QUARTZ/OTH FUSED SILICA FOR VACUUM TUBES | 200000 | 60000 | TAIWAN |